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碳溅射靶
Carbon sputtering target
| 产品编号： | 3064090 |
| 规格： | 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis) |
| 包装规格： | 1each |
| 产品类别： | 进口试剂 |
| 品牌： | Alfa Aesar |
| 优惠价： | 立即咨询 |
产品别名
碳溅射靶
Carbon sputtering target
基本信息
| 应用 | Used as Magnetron sputtering source. The carbon sputtering target was replaced after the de- positions of 20-30 films with several thousand A in thick- ness in mass-separated negative-ion-beam deposition system. Carbon films can also be deposited by magnetron sputtering in which a magnetically confined plasma torus (?“race track?”) acts as a distributed source of ions that impact a carbon sputtering target over a significant part of its area. C -ions were produced from a highly pure carbon-sputtering target by cesium ion sputtering in a neutral and ionized alkaline bombardment-type heavy negative ion source. CN negative ions of 0.88 mA were safely obtained by using a carbon sputtering target and nitrogen gas instead of cyanogen for ionization. |
| 备注 | Thickness tolerance: ^+0.015in; Diameter tolerance: ^+0.020in |
| MDL | MFCD00133992 |
| EINECS | 231-955-3 |
| 灵敏度 | Ambient temperatures. |
| 形态 | Hot Pressed |
| 溶解性 | Insoluble in water. |
安全信息
| TSCA | 是 |
