氧化硼

In the electronics industry as a liquid encapsulent for Czochralski-type growth of III-V semiconductor single crystals (e.g., GaAs, GaP, InP).Boron oxide is used as a flux, an acid catalyst and a chemical intermediate in the production of boron halides, esters, carbide, nitride and metallic borides. It has shown a promising effect on glycerol hydrogenolysis to 1,2-propanediol. It is also an essential material for the preparation of cordierite ceramics from talc. It is actively involved in the production of borosilicate glass. It is an additive used in high-temperature lubricants, heatproof glasswares and dopants in semiconductor materials.

Hygroscopic and moisture sensitive. Incompatible with acids and strong oxidizing agents.

MFCD00011315

215-125-8

B₂O₃

69.62

ca 450°

1860°

2.46 ^+ 0.01

Hygroscopic. Ambient temperatures.

Cylinder, 5.0cm dia, 55g/cylinder

Slightly soluble in water and methanol.

14,1337

60-61
May impair fertility.May cause harm to the unborn child.

53-45
Avoid exposure - obtain special instructions before use.In case of accident or if you feel unwell, seek medical advice immediately (show the label where possible).

ED7900000

是

 

H360
May damage fertility or the unborn child.

P201-P280-P202-P308+P313-P405-P501a
Obtain special instructions before use.Wear protective gloves/protective clothing/eye protection/face protection.Do not handle until all safety precautions have been read and understood.IF exposed or concerned: Get medical advice/attention.Store locked up.Dispose of contents/container in accordance with local/regional/national/international regulations.